Laboratories

Multiprobe Lab

Multiprobe Lab Room K002 Telephone: +49 3641 9-48473 Multiprobe Lab Room K002 Telephone: +49 3641 9-48473 Image: Jens Meyer (University of Jena)

Ultra high vacuum (UHV) Multiprobe System (ScientaOmicron) for analysis of structural, chemical and electronic properties of nanomaterials and sample preparation:

  • operating temperature range 50 – 1300 K
  • sample preparation by PVD and CVD techniques, Ar+ sputtering
  • photoelectron spectroscopy including monochromatic and non-monochromatic XPS (Al Kα, Mg Kα), UPS (e.g., He I), chemical mapping and depth profiling
  • scanning probe techniques including variable temperature AFM and STM
  • low energy electron diffraction (LEED)

Nanosensor Lab

Nanosensor Lab Room 258 Telephone: +49 3641 9-48759 Nanosensor Lab Room 258 Telephone: +49 3641 9-48759 Image: Emad Najafidehaghani

High vacuum (HV) probe station (Lakeshore) for analysis of electrical properties of nanomaterials and devices:

  • Cryogenic vacuum probe station, 4 – 450 K (LakeShore Cryotronics TTPX) for (opto-) electrical characterization in vacuum
  • Light sources (Thorlabs LEDs 365 nm and 455 nm, Thorlabs Pigtailed Laser Diodes)
Nanosensor Lab Room 258 Telephone: +49 3641 9-48759 Nanosensor Lab Room 258 Telephone: +49 3641 9-48759 Image: Emad Najafidehaghani

Ambient air probe stations (Signatone) for analysis of electrical properties of nanomaterials and devices:

  • Precision LCR meter, 20 Hz - 2 MHz (Keysight E4980A)
  • Precision sourcemeters, 1 µA - 200 V and 1 fA - 10 A (Keithley 2614B)
  • Perestalitic pump (Spetec Perimax)
  • Sampling oscilloscope (GwInstek GDS-1052-U)

Telephone: +49 3641 9-48759

Microscopy Lab

Microscopy Lab Room 255 Telephone: +49 3641 9-48750 Microscopy Lab Room 255 Telephone: +49 3641 9-48750 Image: AG Turchanin

Optical Microscopy (Zeiss), Atomic Force Microscopy (NT MDT):

  • AFM (contact and tapping modes) / Lateral Force Microscopy / Phase Imaging/ Force Modulation/ Lithography: AFM (Force)
  • STM/ Magnetic Force Microscopy/ Electrostatic Force Microscopy/ Scanning Capacitance Microscopy/ Kelvin Probe Microscopy
  • Different Measurement modes (air/inert gas atmosphere/liquids)

Chemistry Lab

Chemistry Lab Room 253 Telephone: +49 3641 9-48470 Chemistry Lab Room 253 Telephone: +49 3641 9-48470 Image: AG Turchanin

Sample preparation and functionalization of 2D materials under ambient and inert conditions:

  • Self-assembled monolayer preparation
  • Chemical synthesis of target molecules
  • Millipore water purification system
  • Schlenk technique
  • Ar, O2, N2 supply
Chemistry Lab Room 253 Telephone: +49 3641 9-48470 Chemistry Lab Room 253 Telephone: +49 3641 9-48470 Image: Andrey Turchanin

MP-SPR Navi™ 210A VASA

  • Automated liquid handling of up to 6- different samples for unattended runs
  • Partial loop injections enabling minimized sample consumption
  • 4  simultaneous  measurements  in  2  fluidic  channels,  two independent  wavelength  measurements  from  the  same  spot, enabling detection of thickness and refractive index or conformation changes
  • Exceptionally  wide  angular  range 40˚ - 78˚

Chemical Vapor Deposition (CVD) Lab

CVD Lab Room 254 Telephone: +49 3641 9-48471 CVD Lab Room 254 Telephone: +49 3641 9-48471 Image: Emad Najafidehaghani

Synthesis of 2D transition-metal dichalcogenides by metalorganic chemical vapor deposition (MOCVD)

  • Home-built MOCVD system (Temp: up to 700 °C, Pressure: 10-2 – 103 mbar)
  • Mass Spectrometer (1 - 300 amu) for real-time residual gas analysis attached to the MOCVD reactor for understanding the mechanism of the growth process
CVD Lab Room 254 Telephone: +49 3641 9-48471 CVD Lab Room 254 Telephone: +49 3641 9-48471 Image: Emad Najafidehaghani

Synthesis of 2D transition-metal dichalcogenides by custom-designed chemical vapor deposition (CVD)

  • Two custom-designed CVD systems: One two-zone and one three-zone furnaces (Ambient and inert conditions)
  • Current developed monolayer materials: MoS2, WS2, NbS2, WSe2,MoSe2, NbSe2, MoTe2, 2D lateral heterostructures, wafer-scale MoS2 thin film, etc.
CVD Lab Room 254 Telephone: +49 3641 9-48471 CVD Lab Room 254 Telephone: +49 3641 9-48471 Image: AG Turchanin

Glovebox UNIlab M.Braun

  • Gas cleaning
  • O2 and H2O < 1 ppm
  • Can be used with positive and negative pressure

Microfabrication Lab

Microfabrication Lab Room 259 Telephone: +49 3641 9-48758 Microfabrication Lab Room 259 Telephone: +49 3641 9-48758 Image: AG Turchanin
  • CO2 critical point dryer
  • Spin coater
  • H+, O+ plasma etching
  • Schlenk technique
  • Ar, O2, N2 supply

Nanomembrane Lab

Nanomembrane Lab Room 260 Telephone: +49 3641 9-48751 Nanomembrane Lab Room 260 Telephone: +49 3641 9-48751 Image: AG Turchanin
Electron beam reactor
  • Low Energy Electron (1-500 eV) irradiation of macroscopic samples (up to 4x4 cm2) in High-Vacuum (10-8 mbar)
  • Low Energy Electron Beam Lithography with stencil masks
Autosorb 1
  • Automated gas sorption analyzer
Nanomembrane Lab Room 260 Telephone: +49 3641 9-48751 Nanomembrane Lab Room 260 Telephone: +49 3641 9-48751 Image: Vladislav Stroganov
Mass Spectrometer for residual gas analysis
  • Designed and sold by Hiden Analytical
  • Performs rest gas analysis
  • Electron gun ion source, Quadrupole mass analyzer, Faraday cup and electron multiplier detectors
  • Sensitivity down to 10-14 mbar
  • 9 decades continuous log scale
  • Ability to detect external ions
  • Possibility to easily modify the "sample" side to fit experimental requirements
  • Automated gas sorption analyzer
Nanomembrane Lab Room 260 Telephone: +49 3641 9-48751 Nanomembrane Lab Room 260 Telephone: +49 3641 9-48751 Image: Vladislav Stroganov
3D Printer
  • Form 3 model from Formlabs
  • Utilizes stereolithography (SLA)
  • Wide selection of printing materials with different mechanical properties and colors
  • Chemically resistant materials are also available
  • Build volume dimensions: 145x145x185 mm
  • Layer thickness - 25-100 µm
  • Minimum reliably printed feature size - 1 mm

Characterization Methods

To characterize physical, chemical and functional properties of nanometarials we apply in our group, as well as in collaborative efforts with other groups, various complementary techniques and methods:

Methods Instruments
Spectroscopy Photoelectron and Auger Spectroscopy (XPS/UPS and AES); Near Edge X-ray Absorption Fine Structure Spectroscopy (NEXAFS); Raman Spectroscopy; Polarisation Modulation Infrared Reflection Absorption Spectroscopy (PM-IRRAS); UV-Vis Spectroscopy; Thermal Desorption Spectroscopy (TDS)
Microscopy Scanning Tunnelling Microscopy (STM); Atomic Force Microscopy (AFM); Scanning Electron Microscopy (SEM in HV/UHV); Scanning Auger Microscopy (SAM); Transmission Electron Microscopy (TEM); Methods of Optical Microscopy; Helium Ion Microscopy (HIM)
Diffraction
Methods
Low Energy Electron Diffraction (LEED); X-ray Diffraction; X-ray Reflectivity and Grazing Incidence Diffraction (XR/GIXD)
Nanolithography Extreme UV Interference Lithography (EUV-IL); Electron Beam Lithography (EBL); Photolithography; Micro Contact Printing (µCP)
Nanofabrication Preparation of Self-Assembled Monolayers (SAMs), Free-Standing Supramolecular Sheets and Graphene; Chemical and Physical Vapour Deposition (CVD/PVD); Microfabrication in Clean Room
Other Methods Electrical Transport Measurements; Surface Plasmon Resonance Measurements (SPR); Mass Spectrometer for residual gas analysis
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